Company News
Home / News / Company News / Working Principle of Vacuum Coating Technology

Working Principle of Vacuum Coating Technology



High-Performance Vacuum Coating Systems

Vacuum coating is a thin-film deposition process conducted inside a high-vacuum chamber.
  1. Vacuum Environment Preparation
    Air inside the sealed chamber is pumped out to form a high-vacuum condition, which prevents target materials from reacting with oxygen/nitrogen in ambient air and ensures deposited film purity.
  2. Source Material Vaporization/Atomization
    Based on different technical routes (PVD/CVD):
  • PVD (Physical Vapor Deposition, mainstream for mobile parts): Solid coating targets are excited via high temperature, ion bombardment or arc discharge to evaporate into atomic/molecular particles;
  • CVD: Raw material gas undergoes chemical decomposition to generate coating particles.
  1. Deposition onto Substrate Surface
    Vaporized coating particles fly straight in the vacuum space, adhere and gradually stack on the cleaned workpiece (substrate) surface, forming a uniform, dense thin functional coating layer after continuous accumulation.

Supplement for your mobile phone coating scenario

For cellphone housing production, PVD vacuum coating dominates: metallic targets are sputtered under plasma, depositing decorative, anti-fingerprint or EMI shielding films onto aluminum alloy, stainless steel and plastic substrates without damaging base material inherent properties.